TITANIUM NITRIDE FILMS FOR ULSI APPLICATIONS FORMED BY SPUTTER DEPOSITION FROM A HIGH-PURITY TITANIUM NITRIDE TARGET

被引：0
|
作者：
BRAT, T
TSAI, NS
WICKERSHAM, CE
SINHA, AK
机构：
[1] VARIAN SPECIALTY MET DIV,GROVE CITY,OH 43123
[2] AT&T BELL LABS,ALLENTOWN,PA 18103
[3] UNIV N CAROLINA,DEPT PHYS,CHAPEL HILL,NC 27514
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C451 / C451
页数：1
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