Ultrafast Atomic Layer Deposition of Alumina Layers for Solar Cell Passivation

被引：33

作者：

Poodt, P. ^{[1
]}

Tiba, V. ^{[1
]}

Werner, F. ^{[2
]}

Schmidt, J. ^{[2
]}

Vermeer, A. ^{[3
]}

Roozeboom, F. ^{[1
,4
]}

机构：

[1] TNO, NL-5600 HE Eindhoven, Netherlands

[2] Inst Solar Energy Res Hamelin, D-31860 Emmerthal, Germany

[3] SoLayTec, NL-5652 AM Eindhoven, Netherlands

[4] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2011年 / 158卷 / 09期

关键词：

D O I：

10.1149/1.3610994

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

An ultrafast atomic layer deposition technique is presented, based on the spatial separation of the half-reactions, by which alumina layers can be deposited with deposition rates of more than 1 nm/s. The deposition rate is limited by the water half-reaction, for which a kinetic model has been developed. The alumina layers showed excellent passivation of silicon wafers for solar cell applications. Based on this concept, a high-throughput ALD deposition tool is being developed targeting throughput numbers of up to 3000 wafers/h. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3610994] All rights reserved.

引用

页码：H937 / H940

页数：4

共 50 条

[11] Alumina layers deposited by atomic layer deposition with different precursors: Surface photovoltage measurements
Kolkovsky, Vl.
Dill, P.
MICROELECTRONICS RELIABILITY, 2023, 150
[12] Atomic layer deposited passivation layers for superlattice photodetectors
Salihoglu, Omer
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2014, 32 (05):
[13] Atomic layer deposited passivation layers for superlattice photodetectors
Salihoglu, Omer (omer.salihoglu@tubitak.gov.tr), 1600, American Institute of Physics Inc. (32):
[14] Atomic layer deposited passivation layers for superlattice photodetectors
Salihoglu, Omer
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2014, 32 (05):
[15] Atomic layer deposition of Molybdenum Oxide for solar cell application
Nandi, Dip K.
Sarkar, Shaibal K.
POWER AND ENERGY SYSTEMS III, 2014, 492 : 375 - 379
[16] Atomic layer deposition of tungsten oxide for solar cell application
Nandi, Dip K.
Sarkar, Shaibal K.
4 INTERNATIONAL CONFERENCE ON ADVANCES IN ENERGY RESEARCH (ICAER 2013), 2014, 54 : 782 - 788
[17] Atomic Layer Deposition of zinc oxide for solar cell applications
Moret, M.
Abou Chaaya, A.
Bechelany, M.
Miele, P.
Robin, Y.
Briot, O.
SUPERLATTICES AND MICROSTRUCTURES, 2014, 75 : 477 - 484
[18] Atomic Layer Deposition of Inverse Opals for Solar Cell Applications
Karuturi, Siva Krishna
Liu, Lijun
Su, Liap Tat
Niu, Wenbin
Tok, Alfred Ling Yoong
ADVANCES IN MATERIALS, PROCESSING AND MANUFACTURING, 2013, 789 : 3 - 7
[19] Atomic Layer Deposition of Alumina Passivation Layers in High-Aspect-Ratio Tubular Reactors for Coke Suppression during Thermal Cracking of Hydrocarbon Fuels
Gong, Ting
Hui, Longfei
Zhang, Jianwei
Sun, Daoan
Qin, Lijun
Du, Yongmei
Li, Chunying
Lu, Jian
Hu, Shenlin
Feng, Hao
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2015, 54 (15) : 3746 - 3753
[20] Investigation on reliability of red micro-light emitting diodes with atomic layer deposition passivation layers
Huang, Huang-Hsiung
Huang, Sheng-Kai
Tsai, Yi-Lin
Wang, Shou-Wei
Lee, Yi-Yang
Weng, Shao-Yi
Ku, Hao-Chung
Lin, Chien-Chung
OPTICS EXPRESS, 2020, 28 (25): : 38184 - 38195

← 1 2 3 4 5 →