High-intensity implantation of aluminium ions into VT1-0 titanium alloy

被引：0
|
作者：
Ovchinnikov, V. V. [1 ]
Kurbatova, I. A. [1 ]
Lukyanenko, E. V. [1 ]
Uchevatkina, N. V. [1 ]
Yakutina, S. V. [1 ]
机构：
[1] Moscow Polytech Univ, 38 Bolshaya Semenovskaya St, Moscow 107023, Russia
来源：
INTERNATIONAL CONFERENCE ON MECHANICAL ENGINEERING, AUTOMATION AND CONTROL SYSTEMS 2017 | 2018年 / 327卷
关键词：
D O I：
10.1088/1757-899X/327/3/032057
中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
Structural and phase state of VT1-0 titanium alloy surface layers with different initial grain sizes before and after ion implantation with aluminum ions at the high-dose implantation mode was studied. Implantation of aluminum ions into VT1-0 titanium alloy made it possible to form surface layers with improved performance properties.
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页数：5
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