Investigation of the Features of High-Intensity Implantation of Nitrogen Ions into Titanium

被引:0
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作者
A. I. Ryabchikov
O. S. Korneva
A. I. Ivanova
V. A. Varlachev
A. A. Chernyshev
机构
[1] National Research Tomsk Polytechnic University,
[2] National Research Tomsk State University,undefined
关键词
ion beam; dopants; implantation; high intensity; repetitively pulsed; surface modification; titanium; nitrogen ions; radiation enhanced diffusion; wide ion-doped layers;
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页码:S162 / S165
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