Vibrational energy relaxation of adsorbate vibrations: A theoretical study of the H/Si(111) system

被引：7

作者：

Ermoshin, VA ^{[1
]}

Kazansky, AK ^{[1
]}

Smimov, KS ^{[1
]}

Bougeard, D ^{[1
]}

机构：

[1] CNRS,LASIR,F-59655 VILLENEUVE DASCQ,FRANCE

来源：

JOURNAL OF CHEMICAL PHYSICS | 1996年 / 105卷 / 20期

关键词：

D O I：

10.1063/1.472765

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The energy relaxation rate for the first excited stretching vibration of hydrogen atoms adsorbed on an Si(111) surface is calculated treating the motions of the H atoms quantum mechanically and computing the substrate phonon spectrum by molecular dynamics. The relaxation occurs through excitation of three bending modes and emission of a 188 cm(-1) phonon. (C) 1996 American Institute of Physics.

引用

页码：9371 / 9374

页数：4

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