Vibrational energy relaxation of adsorbate vibrations: A theoretical study of the H/Si(111) system

被引：7
|
作者：
Ermoshin, VA [1 ]
Kazansky, AK [1 ]
Smimov, KS [1 ]
Bougeard, D [1 ]
机构：
[1] CNRS,LASIR,F-59655 VILLENEUVE DASCQ,FRANCE
来源：
JOURNAL OF CHEMICAL PHYSICS | 1996年 / 105卷 / 20期
关键词：
D O I：
10.1063/1.472765
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The energy relaxation rate for the first excited stretching vibration of hydrogen atoms adsorbed on an Si(111) surface is calculated treating the motions of the H atoms quantum mechanically and computing the substrate phonon spectrum by molecular dynamics. The relaxation occurs through excitation of three bending modes and emission of a 188 cm(-1) phonon. (C) 1996 American Institute of Physics.
引用
收藏
页码：9371 / 9374
页数：4
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