Nanoimprint lithography based approach for the fabrication of large-area, uniformly oriented plasmonic arrays

被引：107
|
作者：
Lucas, Brandon D. [2 ]
Kim, Jin-Sung [1 ]
Chin, Christine [3 ]
Guo, L. Jay [1 ]
机构：
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
[2] Univ Michigan Appl Phys, Ann Arbor, MI 48109 USA
[3] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
来源：
ADVANCED MATERIALS | 2008年 / 20卷 / 06期
关键词：
D O I：
10.1002/adma.200700225
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Large-area, uniformly oriented plasmonic arrays are fabricated using nanoimprint lithography. Excellent control of the Localized Surface Plasmon Resonance of the metallic arrays is demonstrated through nanoparticle material composition, size characteristics and polarization effects. This method offers a promising fabrication alternative to exploit LSPR-based applications such as biosensing and surface-enhanced spectroscopies.
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页码：1129 / +
页数：7
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