Ion-beam reduction of the surface of tantalum higher oxide

被引：3

作者：

Alov, N. V. ^{[1
]}

Kutsko, D. M. ^{[1
]}

机构：

[1] Moscow MV Lomonosov State Univ, Fac Chem, Moscow 119991, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES | 2011年 / 5卷 / 02期

关键词：

RAY PHOTOELECTRON-SPECTROSCOPY; OXYGEN; BOMBARDMENT; OXIDATION; METALS; FILMS; NIOBIUM; ESCA;

D O I：

10.1134/S1027451011030037

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The process of reduction of the surface of higher oxide Ta2O5 under irradiation by inert gas (Ar+) and chemically active gas (O (2) (+) ) ions with an energy of 3 keV in high vacuum is investigated by X-ray photoelectron spectroscopy at room temperature. It is found that intermediate oxide TaO2, lower oxide TaO, and metallic Ta form in the surface layers of Ta2O5 under Ar+ ion bombardment. An insignificant amount of intermediate oxide TaO2 forms in the surface layers of Ta2O5 under O (2) (+) ion bombardment. Ion-beam-induced reduction of the Ta2O5 surface is shown to depend on the type of ion and irradiation dose.

引用

页码：259 / 262

页数：4

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