Improved diamond surfaces following lift-off and plasma treatments as observed by x-ray absorption spectroscopy

被引：13
|
作者：
Stacey, Alastair [1 ]
Drumm, Virginia S. [1 ]
Fairchild, Barbara A. [1 ]
Ganesan, Kumar [1 ]
Rubanov, Sergey [2 ]
Kalish, Rafi [3 ,4 ]
Cowie, Bruce C. C. [5 ]
Prawer, Steven [1 ]
Hoffman, Alon [6 ]
机构：
[1] Univ Melbourne, Sch Phys, Melbourne, Vic 3010, Australia
[2] Univ Melbourne, Inst Bio21, Electron Microscopy Unit, Melbourne, Vic 3010, Australia
[3] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
[4] Technion Israel Inst Technol, Inst Solid State, IL-32000 Haifa, Israel
[5] Australian Synchrotron, Clayton, Vic 3168, Australia
[6] Technion Israel Inst Technol, Schulich Fac Chem, IL-32000 Haifa, Israel
来源：
APPLIED PHYSICS LETTERS | 2011年 / 98卷 / 18期
基金：
澳大利亚研究理事会;
关键词：
SINGLE-CRYSTAL DIAMOND; CVD-DIAMOND; ION; DAMAGE; FILMS; EDGE;
D O I：
10.1063/1.3585106
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have investigated the nature of the residual damage in diamond crystals following the ion implantation/graphitization "lift-off" process, using near-edge x-ray absorption fine structure spectroscopy and transmission electron microscopy. A defective but crystalline interface is found, which displays dense pre-edge unoccupied states and an almost complete loss of the core-level C 1s exciton signature. This residual crystalline damage is resistant to standard chemical etching, however a hydrogen plasma treatment is found to completely recover a pristine diamond surface. Analysis and removal of residual ion-induced damage is considered crucial to the performance of many diamond device architectures. (C) 2011 American Institute of Physics. [doi:10.1063/1.3585106]
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页数：3
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