Method to fabricate taper waveguide using fixed-beam moving stage electron-beam lithography

被引:3
|
作者
Mere, Viphretuo [1 ]
Selvaraja, Shankar Kumar [1 ]
机构
[1] Indian Inst Sci, Ctr Nano Sci & Engn, Photon Res Lab, Bengaluru, India
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2019年 / 18卷 / 04期
关键词
e-beam lithography; fixed-electronic-beam-moving-stage; photonic integrated circuits; taper; optical waveguide; slot waveguide; resonator; power splitter; couplers; SILICON; CIRCUITS; ROTATOR;
D O I
10.1117/1.JMM.18.4.043503
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method of tapering waveguides using fixed-electronic-beam-moving-stage (FBMS) paths is presented. The tapering is achieved by joining two FBMS paths to a common point. Compared to conventional area and FBMS tapering methods, the proposed method offers smooth and alignment-error-free tapering between waveguides of different widths. We experimentally demonstrate a fully functional FBMS patterned photonic circuit with a power splitter, wire-to-slot coupler, slot waveguide, and a slotted ring resonator. The device response with an insertion loss of -1.35 dB is measured around 1550-nm wavelength. (C) 2019 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
收藏
页数:4
相关论文
共 50 条
  • [41] ELECTRON-BEAM LITHOGRAPHY FOR MICROCIRCUIT FABRICATION
    AHMED, H
    ELECTRONICS AND POWER, 1976, 22 (07): : 433 - 436
  • [42] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
    LIU, W
    INGINO, J
    PEASE, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
  • [43] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
    LAI, JH
    JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
  • [44] ON DOSE CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    DESHMUKH, PR
    KHOKLE, WS
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (01) : 421 - 423
  • [45] RETICLE GENERATION BY ELECTRON-BEAM LITHOGRAPHY
    BERRIAN, DW
    DOHERTY, JA
    HORVATH, EC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1814 - 1814
  • [46] RESOLUTION LIMITS FOR ELECTRON-BEAM LITHOGRAPHY
    BROERS, AN
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) : 502 - 513
  • [47] ELECTRON-BEAM LITHOGRAPHY: AN OVERVIEW.
    Iida, Yasuo
    Japan Annual Reviews in Electronics, Computers & Telecommunications, 1984, 13 : 287 - 302
  • [48] Contrast limitations in electron-beam lithography
    Crandall, R
    Hofmann, U
    Lozes, RL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2945 - 2947
  • [49] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
    CHANG, THP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
  • [50] ELECTRON-BEAM LITHOGRAPHY FOR SMALL MOSFETS
    WATTS, RK
    FICHTNER, W
    FULS, EN
    THIBAULT, LR
    JOHNSTON, RL
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) : 1338 - 1345