Method to fabricate taper waveguide using fixed-beam moving stage electron-beam lithography

被引:3
|
作者
Mere, Viphretuo [1 ]
Selvaraja, Shankar Kumar [1 ]
机构
[1] Indian Inst Sci, Ctr Nano Sci & Engn, Photon Res Lab, Bengaluru, India
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2019年 / 18卷 / 04期
关键词
e-beam lithography; fixed-electronic-beam-moving-stage; photonic integrated circuits; taper; optical waveguide; slot waveguide; resonator; power splitter; couplers; SILICON; CIRCUITS; ROTATOR;
D O I
10.1117/1.JMM.18.4.043503
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method of tapering waveguides using fixed-electronic-beam-moving-stage (FBMS) paths is presented. The tapering is achieved by joining two FBMS paths to a common point. Compared to conventional area and FBMS tapering methods, the proposed method offers smooth and alignment-error-free tapering between waveguides of different widths. We experimentally demonstrate a fully functional FBMS patterned photonic circuit with a power splitter, wire-to-slot coupler, slot waveguide, and a slotted ring resonator. The device response with an insertion loss of -1.35 dB is measured around 1550-nm wavelength. (C) 2019 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
收藏
页数:4
相关论文
共 50 条
  • [31] Nanopatterning of polyfluorene derivative using electron-beam lithography
    Doi, Y
    Saeki, A
    Koizumi, Y
    Seki, S
    Okamoto, K
    Kozawa, T
    Tagawa, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (05): : 2051 - 2055
  • [32] FABRICATION OF MICRO LENSES USING ELECTRON-BEAM LITHOGRAPHY
    FUJITA, T
    NISHIHARA, H
    KOYAMA, J
    OPTICS LETTERS, 1981, 6 (12) : 613 - 615
  • [33] ELECTRON-BEAM LITHOGRAPHY SYSTEM USING A QUADRUPOLE TRIPLET
    OKAYAMA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 199 - 203
  • [34] ELECTRON-BEAM LITHOGRAPHY USING MEBES-IV
    ABBOUD, F
    GESLEY, M
    COLBY, D
    COMENDANT, K
    DEAN, R
    ECKES, W
    MCCLURE, D
    PEARCEPERCY, H
    PRIOR, R
    WATSON, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2734 - 2742
  • [35] ELECTRON-BEAM LITHOGRAPHY ERROR SOURCES
    CHEN, CK
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 471 : 2 - 7
  • [36] SOME LIMITATIONS ON ELECTRON-BEAM LITHOGRAPHY
    CREWE, AV
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 255 - 259
  • [37] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    NAITO, J
    KITAKOHJI, T
    OKUYAMA, H
    MURAKAWA, K
    POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114
  • [38] PRACTICAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY
    LIVESAY, WR
    SOLID STATE TECHNOLOGY, 1984, 27 (02) : 109 - 109
  • [39] RESEARCH COMPLEX FOR ELECTRON-BEAM LITHOGRAPHY
    BABIN, SV
    DAVYDOV, AV
    ERKO, AI
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1987, 30 (02) : 463 - 469
  • [40] ELECTRON-BEAM LITHOGRAPHY - A GATING ITEM
    CLEMENS, JT
    SOLID STATE TECHNOLOGY, 1989, 32 (03) : 69 - 72