We have investigated the distribution of the flop field, which represents writing field in a toggle magnetic random access memory (MRAM). We analyzed the factors of the distribution by dividing them into the 45 degrees and 135 degrees directions in (H-infinity, H-y) coordinates. We found that the distribution in the 135 degrees direction is mainly caused by stress-induced anisotropy and can be effectively suppressed by adopting materials that maintain low magnetostriction even after the fabrication process. On the other hand, we found that the distribution in the 45 degrees direction depends on the texture and atomic structure of the ferromagnetic layers, and that low distribution can be attained when the ferromagnetic layers are constructed from small crystalline grains or amorphous materials. We demonstrated a toggle MRAM with a distribution of the flop field only half that of the previously reported magnetic tunnel junction stack structure.
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Wang, Zhiguang
Zhang, Yue
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Zhang, Yue
Wang, Yaojin
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Wang, Yaojin
Li, Yanxi
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Li, Yanxi
Luo, Haosu
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Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 201800, Peoples R ChinaVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Luo, Haosu
Li, Jiefang
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA
Li, Jiefang
Viehland, Dwight
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Virginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USAVirginia Tech, Dept Mat Sci & Engn, Blacksburg, VA 24061 USA