Luminescence and reflectivity characterization of AlGaN/GaN high electron mobility transistors

被引:1
|
作者
Baron, N. [1 ]
Leroux, M. [1 ]
Zeggaoui, N. [1 ]
Corfdir, P. [1 ]
Semond, F. [1 ]
Bougrioua, Z. [1 ]
Azize, M. [1 ]
Cordier, Y. [1 ]
Massies, J. [1 ]
机构
[1] CNRS, Ctr Rech Hetero Epitaxie & Ses Applicat, F-06560 Valbonne, France
关键词
OUTPUT POWER-DENSITY; OPTICAL CHARACTERIZATION; GAN; SILICON; SI(111); HEMTS; HETEROSTRUCTURES; SUBSTRATE; SAPPHIRE; GANHEMTS;
D O I
10.1002/pssc.200880828
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report on the optical characterization by photoluminescence and reflectivity of AlxGa1-xN/GaN high electron mobility transistor structures. The samples studied were grown either by molecular beam epitaxy or metal-organic vapor phase epitaxy, on silicon (111) or sapphire (0001) substrates. We focus on a broad luminescence band, shown to be related to the GaN cap layer (surface quantum-well) and its injection intensity dependence. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:S715 / S718
页数:4
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