Non-classical Crystallization of Bulk Crystals in Solution and of Thin Films in the Gas Phase by Chemical Vapor Deposition

被引:4
|
作者
Suk, Jae-Ho [1 ]
Hwang, Nong-Moon [1 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, 1 Gwanak Ro, Seoul, South Korea
基金
新加坡国家研究基金会;
关键词
Non-classical crystallization; Nanoparticles; Solution; Charged nanoparticles; Chemical vapor deposition; LOW-PRESSURE SYNTHESIS; POTASSIUM-CHLORIDE CRYSTALS; CHARGED CLUSTER FORMATION; IN-SITU MEASUREMENTS; CU-O FILMS; MICROCRYSTALLINE SILICON; AQUEOUS-SOLUTIONS; DIAMOND POWDER; NANOCRYSTAL GROWTH; SELF-ORGANIZATION;
D O I
10.1007/s13391-021-00318-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Although non-classical crystallization is a relatively revolutionary concept, where a building block for crystallization is neither an atom nor an ion but a nanoparticle, it has become so much established now that numerous papers as well as several books were published and its tutorial and technical sessions were included in international conferences. The purpose of this paper is to review how non-classical crystallization was developed in solution and in the gas phase synthesis of films by chemical vapor deposition (CVD). Findings made in the study of non-classical crystallization in solution turn out to be very useful in understanding of non-classical crystallization of thin films by CVD. Similarly, findings made in the study of non-classical crystallization of thin films by CVD would be useful in understanding of non-classical crystallization of bulk crystals in solution. Therefore, it is synergistic to review non-classical crystallization both in solution and in the gas phase. For example, the presence of charge in nanoparticles is hardly mentioned in non-classical crystallization in solution whereas it is clearly revealed by the current measurement in the gas phase synthesis of thin films by CVD. The building block in non-classical crystallization is not simply a nanoparticle but a charged nanoparticle (CNP). Many evidences indicate that charged nanoparticles (CNPs) should be liquid-like or superplastic and this property changes abruptly with their charging state and size.
引用
收藏
页码:1 / 26
页数:26
相关论文
共 50 条
  • [31] SOLUTION PRECURSOR CHEMICAL VAPOR-DEPOSITION OF TITANIUM-OXIDE THIN-FILMS
    LU, JP
    WANG, JD
    RAJ, R
    THIN SOLID FILMS, 1991, 204 (01) : L13 - L17
  • [32] Deposition and gas sensing properties of tin oxide thin films by inductively coupled plasma chemical vapor deposition
    Y. C. Lee
    O. K. Tan
    H. Huang
    M. S. Tse
    Journal of Electroceramics, 2006, 16 : 507 - 509
  • [33] Deposition and gas sensing properties of tin oxide thin films by inductively coupled plasma chemical vapor deposition
    Lee, Y. C.
    Tan, O. K.
    Huang, H.
    Tse, M. S.
    JOURNAL OF ELECTROCERAMICS, 2006, 16 (04) : 507 - 509
  • [34] Plasma-Enhanced Chemical Vapor Deposition of Thin GaS Films on Various Types of Substrates
    M. A. Kudryashov
    L. A. Mochalov
    I. O. Prokhorov
    M. A. Vshivtsev
    Yu. P. Kudryashova
    V. M. Malyshev
    E. A. Slapovskaya
    High Energy Chemistry, 2023, 57 : 532 - 536
  • [35] Plasma-Enhanced Chemical Vapor Deposition of Thin GaS Films on Various Types of Substrates
    Kudryashov, M. A.
    Mochalov, L. A.
    Prokhorov, I. O.
    Vshivtsev, M. A.
    Kudryashova, Yu. P.
    Malyshev, V. M.
    Slapovskaya, E. A.
    HIGH ENERGY CHEMISTRY, 2023, 57 (06) : 532 - 536
  • [36] Metallorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition
    Van Buskirk, Peter C.
    Bilodeau, Steve M.
    Roeder, Jeffrey F.
    Kirlin, Peter S.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2520 - 2525
  • [37] Metalorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition
    VanBuskirk, PC
    Bilodeau, SM
    Roeder, JF
    Kirlin, PS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (4B): : 2520 - 2525
  • [38] Non-classical nucleation in vapor–liquid–solid growth of monolayer WS2 revealed by in-situ monitoring chemical vapor deposition
    Xiaoming Qiang
    Yuta Iwamoto
    Aoi Watanabe
    Tomoya Kameyama
    Xing He
    Toshiro Kaneko
    Yasushi Shibuta
    Toshiaki Kato
    Scientific Reports, 11
  • [39] PLASMA CHEMICAL VAPOR-DEPOSITION OF THIN PLATINUM FILMS
    FEURER, E
    KRAUS, S
    SUHR, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04): : 2799 - 3802
  • [40] USING CHEMICAL VAPOR DEPOSITION TO MAKE DIELECTRIC THIN FILMS
    CAFFREY, RE
    HAUSER, VE
    BELL LABORATORIES RECORD, 1971, 49 (02): : 38 - &