Highly conductive titanium oxide films by RF magnetron sputtering

被引：5
|
作者：
Sakaguchi, Koichi [1 ]
Fukazawa, Masaki [1 ]
Shimakawa, Koichi [2 ,3 ]
Hatanaka, Yoshinori [1 ]
机构：
[1] Aichi Univ Technol, Fac Engn, 50-2 Manori, Gamagori, Aichi 4430047, Japan
[2] Gifu Univ, Dept Elect & Elect Engn, Gifu 5011193, Japan
[3] Nagoya Ind Sci Res Inst, Nagoya, Aichi 4600008, Japan
来源：
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 9 | 2011年 / 8卷 / 09期
关键词：
titanium oxide; transparent conducting electrode; magnetron sputtering; conductive film; PHOTOCONDUCTIVITY;
D O I：
10.1002/pssc.201084051
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Transparent conductive titanium oxide films have been prepared by the radio frequency (RF) magnetron sputtering. By introducing water vapor into argon gas in the sputtering processes and sputtering at high pressure, 25 Pa, highly conductive transition of electrical conductivity from 10(-4) Scm(-1) to around 10(2) S cm(-1) is obtained. The observation of the Burnstein-Moss shift in optical absorption and the dielectric constants deduced from infrared spectroscopy measurement suggest that the metallic films are obtained in the present technique. X-ray diffraction analysis shows a new phase creation with an aliened polycrystalline feature, but details are not clear. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码：2742 / 2745
页数：4
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