Optical lithography technology

被引：0
|
作者：
Magome, N
机构：
来源：
INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING | 1996年 / 30卷 / 02期
关键词：
optical lithography; g-line; i-line; KrF; ArF; excimer laser; stepper; scanner;
D O I：
暂无
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
Optical lithography technology for the recent progress from the g-line to the i-line and KrF steppers is reviewed taking into consideration three key factors in semiconductor manufacturing: pattern shrinkage, high integration and productivity. Then, issues relating to these three factors for 1G DRAMs are examined using a scanning exposure tool.
引用
收藏
页码：99 / 102
页数：4
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