Future of optical lithography

被引：0
|
作者：
Okazaki, S [1 ]
机构：
[1] ASET, EUV Lithog Lab, Atsugi, Kanagawa 2430198, Japan
来源：
18TH CONGRESS OF THE INTERNATIONAL COMMISSION FOR OPTICS: OPTICS FOR THE NEXT MILLENNIUM, TECHNICAL DIGEST | 1999年 / 3749卷
关键词：
D O I：
10.1117/12.354770
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The history of optical lithography is reviewed as a basis for discussing its future. The key methods used so far to boost the resolution are: the use of a higher numerical aperture, reduction of the exposure wavelength, and the introduction of resolution enhancement technologies. For the continued use of optical lithography in the future, the exposure wavelength must be reduced. The two approaches to doing this - a gradual reduction and a sudden, large reduction - are compared.
引用
收藏
页码：328 / 329
页数：2
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