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Optical lithography - present and future challenges

被引：38
|
作者：
Lin, Burn J. [1 ]
机构：
[1] TSMC Ltd, Hsinchu 30077, Taiwan
来源：
COMPTES RENDUS PHYSIQUE | 2006年 / 7卷 / 08期
关键词：
microlithography; optical lithography; immersion lithography;
D O I：
10.1016/j.crhy.2006.10.005
中图分类号：
P1 [天文学];
学科分类号：
0704 ;
摘要：
Optical lithography has been an industrial workhorse for many decades. It has reached a wavelength of 193 nm, a Numerical Aperture (NA) of 0.93 but was facing difficulties to advance further until the debut of immersion lithography. This review deals with the limit of dry and immersion lithography systems, their present and future challenges to reach these very limits. A discussion of defects in immersion lithography, the status of immersion lithography, polarized illumination, high-index materials, solid-immersion mask, double exposure and double patterning is included. (2006). 2006 Academic des sciences. Published by Elsevier Masson SAS. All rights reserved.
引用
收藏
页码：858 / 874
页数：17
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