Optical lithography technology

被引：0
|
作者：
Magome, N
机构：
来源：
INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING | 1996年 / 30卷 / 02期
关键词：
optical lithography; g-line; i-line; KrF; ArF; excimer laser; stepper; scanner;
D O I：
暂无
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
Optical lithography technology for the recent progress from the g-line to the i-line and KrF steppers is reviewed taking into consideration three key factors in semiconductor manufacturing: pattern shrinkage, high integration and productivity. Then, issues relating to these three factors for 1G DRAMs are examined using a scanning exposure tool.
引用
收藏
页码：99 / 102
页数：4
相关论文
共 50 条
  • [1] Mask technology for optical lithography
    Cummings, KD
    Schellenberg, FM
    [J]. JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (02): : 202 - 202
  • [2] Advanced technology for extending optical lithography
    Wagner, C
    Keiser, W
    Mulkens, J
    Flagello, DC
    [J]. OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 : 344 - 357
  • [3] RESIST TECHNOLOGY FOR SUBMICROMETER OPTICAL LITHOGRAPHY
    BRUNSVOLD, WR
    CROCKATT, DM
    HEFFERON, GJ
    LYONS, CF
    [J]. OPTICAL ENGINEERING, 1987, 26 (04) : 330 - 336
  • [4] Optical lithography with 157-nm technology
    Modderman, T
    Jasper, H
    Boom, H
    Uitterdijk, T
    Dana, S
    Sewell, H
    O'Neil, T
    Mulkens, J
    Brunotte, M
    Mecking, B
    Gruner, T
    [J]. OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 816 - 826
  • [5] Polarized effects in optical lithography with high NA technology
    Kim, Sang-Kon
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 50 (06) : 1952 - 1958
  • [6] Feasibility of printing 0.1 μm technology with optical lithography
    Maenhoudt, M
    Verhaegen, S
    Ronse, K
    Flagello, D
    Geh, B
    Kaiser, W
    [J]. OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 347 - 357
  • [7] Advanced technology for low-k1 optical lithography
    [J]. Wagner, Christian, 2000, PennWell Publ Co, Tulsa, OK, United States (09):
  • [8] Studies on limitation of optical lithography for various resolution enhancement technology
    Eom, TS
    Ahn, CN
    Park, DH
    Koh, CW
    Bok, CK
    [J]. OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 1575 - 1583
  • [9] Binary halftone chromeless PSM technology for λ/4 optical lithography
    Chen, JF
    Petersen, JS
    Socha, R
    Laidig, T
    Wampler, KE
    Nakagawa, K
    Hughes, G
    MacDonald, S
    Ng, W
    [J]. OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 : 515 - 533
  • [10] New uses of IC technology will enable better opportunities for optical lithography
    Resor, Griff
    [J]. SOLID STATE TECHNOLOGY, 2007, 50 (11) : 55 - 55
12345