Chemically amplified deep-ultraviolet photoresist

被引：0
|
作者：
Reichmanis, E
机构：
[1] Lucent Technol, Mat & Proc Res Lab, Polymer & Organ Mat Res, Murray Hill, NJ 07974 USA
[2] Olin Microelect Mat Inc, E Providence, RI 02914 USA
来源：
ADVANCED MATERIALS & PROCESSES | 1996年 / 150卷 / 03期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：41 / 42
页数：2
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