Surface plasmon leakage in its coupling with an InGaN/GaN quantum well through an Ohmic contact

被引:0
|
作者
Yeh, Dong-Ming [1 ]
Huang, Chi-Feng [1 ]
Lu, Yen-Cheng [1 ]
Chen, Cheng-Yen [1 ]
Tang, Tsung-Yi [1 ]
Huang, Jeng-Jie [1 ]
Shen, Kun-Ching [1 ]
Yang, Ying-Jay [1 ]
Yang, C. C. [1 ]
机构
[1] Natl Taiwan Univ, Grad Inst Electroopt Engn, Taipei 10764, Taiwan
关键词
surface plasmon; quantum well; Ohmic contact;
D O I
10.1109/OMEMS.2007.4373872
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate the loss of surface plasmon (SP) energy through oscillating electron leakage via the Ohmic contact of either p-type or n-type GaN layer in the coupling process between SP and an InGaN/GaN quantum well (QW). The observation implies that in using the SP-QW coupling for enhancing emission in a light-emitting diode, the metals for Ohmic contact and SP generation must be separated. A thin dielectric interlayer is required in the region for SP-QW coupling to avoid the leakage of SP energy.
引用
收藏
页码:125 / 126
页数:2
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