A reliability study in P-channel punchthrough for ASIC CMOS input/output buffer leakage

被引:0
|
作者
Spory, Erick M. [1 ]
机构
[1] Atmel Corp, Dept Failure Anal, Colorado Springs, CO 80906 USA
关键词
D O I
10.1109/IRWS.2007.4469241
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Quite simply, does CMOS punchthrough leakage current present a reliability risk? Does this form of leakage accelerate any other failure mechanisms or alter device performance within the circuit? This paper empirically answers these questions while providing an academic understanding of the mechanism and why it dose not pose a reliability risk.
引用
收藏
页码:139 / 142
页数:4
相关论文
共 50 条
  • [31] Influence of Dielectrics and Channel Defects on the Electrical Performance of Oxide-based p-Channel TFTs for CMOS Applications
    Akkili, Viswanath G.
    Thangavel, R.
    Srivastava, Viranjay M.
    2021 IEEE LATIN AMERICA ELECTRON DEVICES CONFERENCE (LAEDC), 2021,
  • [32] New hot carrier failure criterion for p-channel transistors based on transistor leakage currents
    Doyle, BS
    Mistry, KR
    SOLID-STATE ELECTRONICS, 1996, 39 (11) : 1681 - 1682
  • [33] Conduction mechanisms of oxide leakage current in p-channel 4H-SiC MOSFETs
    Nemoto, Hiroki
    Okamoto, Dai
    Zhang, Xufang
    Sometani, Mitsuru
    Okamoto, Mitsuo
    Hatakeyama, Tetsuo
    Harada, Shinsuke
    Iwamuro, Noriyuki
    Yano, Hiroshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (04)
  • [34] THE STUDY ON HOLE MOBILITY IN THE INVERSION LAYER OF P-CHANNEL MOSFET
    KANEKO, M
    NARITA, I
    MATSUMOTO, S
    IEEE ELECTRON DEVICE LETTERS, 1985, 6 (11) : 575 - 577
  • [35] Study of Threshold Voltage of p-channel Four Gate Transistor
    Noor, Samantha Lubaba
    Haq, A. F. M. Saniul
    Hassan, Muhsiul
    Debnath, Bishwajit
    Islam, Md Sariful
    Khan, M. Ziaur Rahman
    2013 INTERNATIONAL CONFERENCE ON INFORMATICS, ELECTRONICS & VISION (ICIEV), 2013,
  • [37] Study of leakage current in n-channel and p-channel polycrystalline silicon thin-film transistors by conduction and low frequency noise measurements
    Angelis, CT
    Dimitriadis, CA
    Samaras, I
    Brini, J
    Kamarinos, G
    Gueorguiev, VK
    Ivanov, TE
    JOURNAL OF APPLIED PHYSICS, 1997, 82 (08) : 4095 - 4101
  • [38] Leakage drain current behavior in an accumulation mode SOI p-channel MOSFET operating at high temperatures
    Bellodi, M
    Martino, JA
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 1999, 2 (07) : 345 - 346
  • [39] Substrate Bias Considerations for Low Leakage 16nm P-Channel Carbon Nanotube Transistors
    Sun, Yanan
    Kursun, Volkan
    2011 IEEE 54TH INTERNATIONAL MIDWEST SYMPOSIUM ON CIRCUITS AND SYSTEMS (MWSCAS), 2011,
  • [40] A study on channel design for 0.1 mu m buried p-channel MOSFET's
    Shamarao, P
    Ozturk, MC
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (11) : 1942 - 1949