Application of Localization Factor for the Detection of Tin Oxidation with AFM

被引：0
|
作者：
Bonyar, Attila [1 ]
机构：
[1] Budapest Univ Technol & Econ, Dept Elect Technol, Budapest, Hungary
来源：
2015 IEEE 21ST INTERNATIONAL SYMPOSIUM FOR DESIGN AND TECHNOLOGY IN ELECTRONIC PACKAGING (SIITME) | 2015年
关键词：
atomic force microscopy; localization factor; surface roughness; tin oxidation; SYSTEMS;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The aim of this paper is the demonstration of a novel parameter called localization factor for the detection and monitoring of tin surface oxidation through atomic force microscope (AFM) imaging. A previously polished and oxide free tin surface was oxidized in a controlled environment and the resulting surface topography was evaluated numerically with AFM. Results indicate that the obtained localization factor values correlate well with the structural changes of the surface, namely with the development of the oxide grains.
引用
收藏
页码：25 / 30
页数：6
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