Hot-wire chemical vapor deposition of crystalline tungsten oxide nanoparticles at high density

被引:66
|
作者
Mahan, AH [1 ]
Parilla, PA [1 ]
Jones, KM [1 ]
Dillon, AC [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1016/j.cplett.2005.07.037
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Tungsten oxide nanostructured rods, particles and occasionally tubes are deposited by heating a tungsten filament in a partial oxygen atmosphere. Transmission electron microscopy (TEM) reveals the nanorods have similar to 10-50 nm diameters and similar to 50-200 nm lengths. The nanoparticle size ranges from similar to 10 to 200 nm. The nanostructures are generally crystalline and predominantly consist of the WO3 monoclinic (I) gamma-phase with some monoclinic (II) epsilon-phase and/or tungsten metal present. Under optimal synthesis conditions, only crystalline nanostructures with a largest dimension of similar to 200 nm are observed with TEM analyses. Further characterization conclusively shows that these 'optimal' nanostructures are comprised of only the WO3 monoclinic (I) gamma-phase. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:88 / 94
页数:7
相关论文
共 50 条
  • [31] Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition
    Yokomichi, H
    Masuda, A
    Kishimoto, N
    THIN SOLID FILMS, 2001, 395 (1-2) : 249 - 252
  • [32] Switching behavior of microcrystalline silicon deposited by hot-wire chemical vapor deposition
    Hu, J
    Stradins, P
    Branz, HM
    Wang, Q
    Huie, B
    Weinberg-Wolf, JR
    Harley, ECT
    Wang, KD
    Han, DX
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (07)
  • [33] Thin-film transistors deposited by hot-wire chemical vapor deposition
    Stannowski, B
    Rath, JK
    Schropp, REI
    THIN SOLID FILMS, 2003, 430 (1-2) : 220 - 225
  • [34] Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films
    Lau, KKS
    Lewis, HGP
    Limb, SJ
    Kwan, MC
    Gleason, KK
    THIN SOLID FILMS, 2001, 395 (1-2) : 288 - 291
  • [35] Tandem solar cells deposited using hot-wire chemical vapor deposition
    van Veen, MK
    van der Werf, CHM
    Schropp, REI
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 : 655 - 658
  • [36] Hot-wire chemical vapor deposition of epitaxial film crystal silicon for photovoltaics
    Branz, Howard M.
    Teplin, Charles W.
    Romero, Manuel J.
    Martin, Ina T.
    Wang, Qi
    Alberi, Kirstin
    Young, David L.
    Stradins, Paul
    THIN SOLID FILMS, 2011, 519 (14) : 4545 - 4550
  • [37] On the possibility to grow zinc oxide-based transparent conducting oxide films by hot-wire chemical vapor deposition
    Abrutis, Adulfas
    Silimavicus, Laimis
    Kubilius, Virgaudas
    Murauskas, Tomas
    Saltyte, Zita
    Kuprenaite, Sabina
    Plausinaitiene, Valentina
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (02):
  • [38] Strategy for silicon based hot-wire chemical vapor deposition without wire silicide formation
    Laukart, Artur
    Harig, Tino
    Hoefer, Markus
    Schaefer, Lothar
    THIN SOLID FILMS, 2015, 575 : 38 - 41
  • [40] Process analysis and modeling of thin silicon film deposition by hot-wire chemical vapor deposition
    Aparicio, R
    Birkmire, R
    Pant, A
    Huff, M
    Russell, TWF
    FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV, 2001, 2001 (13): : 260 - 267