Hot-wire chemical vapor deposition of crystalline tungsten oxide nanoparticles at high density

被引:66
|
作者
Mahan, AH [1 ]
Parilla, PA [1 ]
Jones, KM [1 ]
Dillon, AC [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1016/j.cplett.2005.07.037
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Tungsten oxide nanostructured rods, particles and occasionally tubes are deposited by heating a tungsten filament in a partial oxygen atmosphere. Transmission electron microscopy (TEM) reveals the nanorods have similar to 10-50 nm diameters and similar to 50-200 nm lengths. The nanoparticle size ranges from similar to 10 to 200 nm. The nanostructures are generally crystalline and predominantly consist of the WO3 monoclinic (I) gamma-phase with some monoclinic (II) epsilon-phase and/or tungsten metal present. Under optimal synthesis conditions, only crystalline nanostructures with a largest dimension of similar to 200 nm are observed with TEM analyses. Further characterization conclusively shows that these 'optimal' nanostructures are comprised of only the WO3 monoclinic (I) gamma-phase. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:88 / 94
页数:7
相关论文
共 50 条
  • [21] Spontaneous generation of negatively charged clusters and their deposition as crystalline films during hot-wire silicon chemical vapor deposition
    Kim, Jin-Yong
    Kim, Doh-Yeon
    Hwang, Nong-Moon
    PURE AND APPLIED CHEMISTRY, 2006, 78 (09) : 1715 - 1722
  • [22] High quality amorphous silicon film fabrication by hot-wire chemical vapor deposition technique
    Chen, Guo
    Zhu, Meifang
    Sun, Jinglan
    Guo, Xiaoxu
    Su, Yixi
    Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 1997, 18 (03): : 269 - 272
  • [23] Anomalously high thermal conductivity of amorphous Si deposited by hot-wire chemical vapor deposition
    Yang, Ho-Soon
    Cahill, David G.
    Liu, X.
    Feldman, J. L.
    Crandall, R. S.
    Sperling, B. A.
    Abelson, J. R.
    PHYSICAL REVIEW B, 2010, 81 (10)
  • [24] Effects of Hot Wire Temperature on Properties of GeSi:H Films with High Hydrogen Dilution by Hot-Wire Chemical Vapor Deposition
    TAI Xin
    LI Xingbing
    ZHEN Huang
    SHEN Honglie
    LI Yufang
    HUANG Haibin
    Wuhan University Journal of Natural Sciences, 2019, 24 (05) : 405 - 408
  • [25] Effect of HCl addition on the crystalline fraction in silicon thin films prepared by hot-wire chemical vapor deposition
    Chung, Yung-Bin
    Lee, Dong-Kwon
    Kim, Chan-Soo
    Hwang, Nong-Moon
    VACUUM, 2009, 83 (12) : 1431 - 1434
  • [26] POLYCRYSTALLINE SILICON FILMS OBTAINED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION
    CIFRE, J
    BERTOMEU, J
    PUIGDOLLERS, J
    POLO, MC
    ANDREU, J
    LLORET, A
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1994, 59 (06): : 645 - 651
  • [27] Mechanisms of growth of nanocrystalline silicon deposited by hot-wire chemical vapor deposition
    Moutinho, HR
    Jiang, CS
    Xu, Y
    To, B
    Jones, KM
    Teplin, CW
    Al-Jassim, MM
    CONFERENCE RECORD OF THE THIRTY-FIRST IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2005, 2005, : 1496 - 1499
  • [28] Hot-Wire Chemical Vapor Deposition of Fluoropolymer Coatings on Rotating Cylindrical Surfaces
    Safonov, A., I
    Starinskiy, S., V
    Sulyaeva, V. S.
    TECHNICAL PHYSICS LETTERS, 2021, 47 (02) : 205 - 207
  • [29] Hot-wire chemical vapor deposition epitaxy on polycrystalline silicon seeds on glass
    Teplin, Charles W.
    Branz, Howard M.
    Jones, Kim M.
    Romero, Manuel J.
    Stradins, Paul
    Gall, Stefan
    AMORPHOUS AND POLYCRYSTALLINE THIN-FILM SILICON SCIENCE AND TECHNOLOGY 2007, 2007, 989 : 133 - +
  • [30] Hot-Wire Chemical Vapor Deposition of Fluoropolymer Coatings on Rotating Cylindrical Surfaces
    A. I. Safonov
    S. V. Starinskiy
    V. S. Sulyaeva
    Technical Physics Letters, 2021, 47 : 205 - 207