Electrical and optical properties of thick highly doped p-type GaN layers grown by HVPE

被引:26
|
作者
Usikov, A. [1 ]
Kovalenkov, O. [1 ]
Soukhoveev, V. [1 ]
Ivantsov, V. [1 ]
Syrkin, A. [1 ]
Dmitriev, V. [1 ]
Nikiforov, A. Yu. [2 ]
Sundaresan, S. G. [3 ]
Jeliazkov, S. J. [4 ]
Davydov, A. V. [4 ]
机构
[1] Technol & Devices Int Inc, 12214 Plum Orchard Dr, Silver Spring, MD 20904 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[3] George Mason Univ, Dept Elect & Comp Engn, Fairfax, VA 22030 USA
[4] NIST, Gaithersburg, MD 20899 USA
关键词
D O I
10.1002/pssc.200778685
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper we report 3-7 mu m thick p-GaN growth by hydride vapor phase epitaxy (HVPE) on sapphire substrates. Mg impurity was used for doping. As-grown GaN layers had p-type conductivity with concentration N-A-N-D up to 3x10(19) cm(-3). Mg atom concentration was varied from 10(17) to 10(20) cm(-3). Hydrogen concentration was about 10 times less than that for Mg, which may explain effective p-type doping for as-grown GaN layers. Micro-cathodoluminescence revealed a columnar-like structure of the GaN layers with a non-uniform distribution of material regions having dominant 362 nm or 430 nm luminescence. Use of these thick p-GaN layers to grow InGaN-based blue and green LEDs by the HVPE is demonstrated.
引用
收藏
页码:1829 / +
页数:2
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