Efficient infrared emission from periodically patterned thin metal films on a Si photonic crystal

被引：0
|
作者：
Theodoni, P. [1 ]
Bayiati, P. [1 ]
Chatzichristidi, M. [1 ]
Speliotis, Th. [2 ]
Vamvakas, V. Em. [1 ]
Raptis, I. [1 ]
Papanikolaou, N. [1 ]
机构：
[1] NCSR Demokritos, Inst Microelect, GR-15310 Athens, Greece
[2] NCSR Demokritos, Inst Mat Sci, GR-15310 Athens, Greece
来源：
MICROELECTRONIC ENGINEERING | 2008年 / 85卷 / 5-6期
关键词：
infrared thermal emitter; photonic crystal; optical lithography;
D O I：
10.1016/j.mee.2007.12.062
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have fabricated a periodic array of holes with diameters of a few microns on thin metal films on a Si substrate by using lithographic techniques, and demonstrate that the structures show extraordinary transmission in the infrared spectrum. Our structures become efficient narrow-band infrared thermal emitters when the hole pattern is transferred to the Si substrate by dry etching using the metal as a mask. The influence of the geometrical parameters, like the hole depth and diameter, on the emission spectra was considered in order to optimize the optical properties. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：1112 / 1115
页数：4
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