On Ni diffusion at Si(111) surface at Fe coadsorption

被引：0

作者：

Dolbak, AE ^{[1
]}

Olshanetsky, BZ ^{[1
]}

Zhachuk, RA ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Semicond Phys, Siberian Branch, Novosibirsk 630090, Russia

来源：

PHYSICS OF LOW-DIMENSIONAL STRUCTURES | 1998年 / 9-10卷

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D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of Fe atoms coadsorption on the diffusion of adsorbed Ni atoms at Si(111) surface has been studied by low energy electron diffraction and Auger electron spectroscopy. It has been shown that the coadsorption of submonolayer quantities of Fe increases markedly the Ni surface diffusion which is most conspicuous in the 750-600 degrees C temperature range. It has been also shown that the dependence of the Ni surface diffusion coefficients versus temperature is a nonmonotonous function.

引用

页码：97 / 103

页数：7

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