共 50 条
- [1] Recording head metrology at sub-100 nm device dimensions [J]. 1600, American Institute of Physics Inc. (97):
- [2] Sub-100 nm metrology using interferometrically produced fiducials [J]. J Vac Sci Technol B Microelectron Nanometer Struct, (2692-2697):
- [3] Ultraprecision CD metrology for sub-100 nm patterns by AFM [J]. Characterization and Metrology for ULSI Technology 2005, 2005, 788 : 369 - 378
- [4] Sub-100 nm metrology using interferometrically produced fiducials [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2692 - 2697
- [5] Magnetic reversal of sub-100 nm nanostructures studied by a FIB-trimmed recording head [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2007, 13 (02): : 129 - 132
- [6] Magnetic reversal of sub-100 nm nanostructures studied by a FIB-trimmed recording head [J]. Microsystem Technologies, 2007, 13 : 129 - 132
- [7] Implementation of the ArF resists based on VEMA for sub-100 nm device [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 533 - 540
- [9] Micromagnetic simulation of a flux guide for a read head with sub-100 nm resolution [J]. 1600, Am Inst Phys, Woodbury, NY, USA (87):
- [10] Characterization and control of sub-100 nm etch and lithography processes using atomic force metrology [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 1325 - 1330