Recording head metrology at sub-100 nm device dimensions

被引:0
|
作者
机构
[1] Gokemeijer, N.J.
[2] Clinton, T.W.
[3] Crawford, T.M.
[4] Johnson, Mark
来源
| 1600年 / American Institute of Physics Inc.卷 / 97期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Recording head metrology at sub-100 nm device dimensions
    Gokemeijer, NJ
    Clinton, TW
    Crawford, TM
    Johnson, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2005, 97 (08)
  • [2] Sub-100 nm metrology using interferometrically produced fiducials
    [J]. J Vac Sci Technol B Microelectron Nanometer Struct, (2692-2697):
  • [3] Ultraprecision CD metrology for sub-100 nm patterns by AFM
    Gonda, S
    Kinoshita, K
    Noguchi, H
    Kurosawa, T
    Koyanagi, H
    Murayama, K
    Terasawa, T
    [J]. Characterization and Metrology for ULSI Technology 2005, 2005, 788 : 369 - 378
  • [4] Sub-100 nm metrology using interferometrically produced fiducials
    Schattenburg, ML
    Chen, C
    Everett, PN
    Ferrera, J
    Konkola, P
    Smith, HI
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2692 - 2697
  • [5] Magnetic reversal of sub-100 nm nanostructures studied by a FIB-trimmed recording head
    Albrecht, M.
    Rettner, C. T.
    Moser, A.
    Terris, B. D.
    [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2007, 13 (02): : 129 - 132
  • [6] Magnetic reversal of sub-100 nm nanostructures studied by a FIB-trimmed recording head
    M. Albrecht
    C. T. Rettner
    A. Moser
    B. D. Terris
    [J]. Microsystem Technologies, 2007, 13 : 129 - 132
  • [7] Implementation of the ArF resists based on VEMA for sub-100 nm device
    Kim, HW
    Lee, S
    Choi, SJ
    Lee, SH
    Kang, Y
    Woo, SG
    Nam, D
    Chae, YS
    Kim, J
    Moon, JT
    Kavanagh, R
    Barclay, G
    [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 533 - 540
  • [8] Role of multiple delta doping in PHEMTs scaled to sub-100 nm dimensions
    Kalna, K
    Asenov, A
    [J]. SOLID-STATE ELECTRONICS, 2004, 48 (07) : 1223 - 1232
  • [10] Characterization and control of sub-100 nm etch and lithography processes using atomic force metrology
    Miller, K
    Geiszler, V
    Dawson, D
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 1325 - 1330