共 50 条
- [31] Sub-100 nm soft lithography for optoelectronics applications [J]. 2007 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2, 2007, : 331 - 332
- [32] Sub-100 nm structures by neutral atom lithography [J]. MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 105 - 108
- [33] Sub-100 nm patterning with an amorphous fluoropolymer mold [J]. LANGMUIR, 2004, 20 (06) : 2445 - 2448
- [34] Templated fabrication of sub-100 nm periodic nanostructures [J]. CHEMICAL COMMUNICATIONS, 2008, (27) : 3163 - 3165
- [35] Resist requirements for sub-100 nm microlithography. [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 215 : U191 - U191
- [36] Optimal sampling strategies for sub-100 nm overlay [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII, 1998, 3332 : 348 - 359
- [37] Sub-100 nm IR spectromicroscopy of living cells [J]. OPTICS LETTERS, 2008, 33 (14) : 1611 - 1613
- [38] Low frequency noise in sub-100 nm MOSFETs [J]. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2003, 19 (1-2): : 13 - 17
- [40] Hardmask technology for sub-100 nm lithographic imaging [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 152 - 165