Structural parameters affecting the performance of non-volatile memory based on organic field-effect transistors

被引:4
|
作者
Gong, Lin [1 ]
Goebel, Holger [1 ]
机构
[1] Helmut Schmidt Univ, Fac Elect Engn, Chair Elect, Hamburg, Germany
关键词
FLOATING-GATE; VOLTAGE; FULLERENE; STORAGE; METAL;
D O I
10.1016/j.mee.2018.11.004
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To obtain better memory performance, we have varied different structural parameters such as thickness of the gold electrodes d(Au) and thickness of the electret d(e) for organic non-volatile memory (ONVM) devices based on pentacene field-effect transistors. It was found that the memory devices gained larger memory windows by increasing d(Au). This effect is attributed to the improved electron injection at the Au/pentacene contact. On the other hand, decreasing d(e) facilitated the transport of the injected electrons, leading to a highly efficient programming. However, both strategies in excessive cases would unfortunately suffer from some limitations, which should be considered for practical applications. Additionally, with help of the results, we achieved an overall understanding about the operating mechanism of this memory type in aspects of charge injection and charge trapping.
引用
收藏
页码:31 / 37
页数:7
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