Effects of low-temperature annealing on polycrystalline silicon for solar cells

被引:5
|
作者
Slunjski, Robert [1 ]
Capan, Ivana [1 ]
Pivac, Branko [1 ]
Le Donne, Alessia [2 ,3 ]
Binetti, Simona [2 ,3 ]
机构
[1] Rudjer Boskovic Inst, HR-10000 Zagreb, Croatia
[2] Univ Milano Bicocca, CNISM, I-20125 Milan, Italy
[3] Univ Milano Bicocca, Dept Mat Sci, Milano Bicocca Solar Energy Res Ctr MIB SOLAR, I-20125 Milan, Italy
关键词
Silicon; Defects; Dislocations; DLTS; Photoluminescence; Solar cells; FED GROWTH-SILICON; POINT-DEFECTS; DEEP LEVELS; EFG; DISLOCATIONS; CARBON; PHOTOLUMINESCENCE; CONTAMINATION; TRANSPORT; SHEETS;
D O I
10.1016/j.solmat.2010.09.016
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The polycrystalline silicon material grown by the edge-defined film-fed growth technique, and often used in solar cell production, is known to be carbon and dislocation rich. Aim of this work was to explore the effect of low-temperature annealing in vacuum on properties of these structural defects, often present in different solar-grade materials. Electrical measurements by deep level transient spectroscopy revealed the presence of the defects typically found in dislocated silicon. Detailed analysis further suggested that they are also carbon related, exhibiting quite unexpected behavior at such low-temperature annealing. Moreover, photoluminescence results showed electron-hole droplet condensation at dislocations after such low-temperature annealing. This further supports the hypothesis that point defects are incorporated at dislocation cores rather than in a cloud at its proximity. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:559 / 563
页数:5
相关论文
共 50 条
  • [31] LOW-TEMPERATURE THERMAL ANNEALING OF ARSENIC IMPLANTED SILICON
    SCOVELL, PD
    YOUNG, JM
    ELECTRONICS LETTERS, 1980, 16 (16) : 614 - 615
  • [32] ANNEALING OF SUPERSATURATED LOW-TEMPERATURE SUBSTITUTIONAL GOLD IN SILICON
    MOROOKA, M
    TOMOKAGE, H
    YOSHIDA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (08): : 1161 - 1164
  • [33] CRYSTALLIZATION OF LPCVD SILICON FILMS BY LOW-TEMPERATURE ANNEALING
    AOYAMA, T
    KAWACHI, G
    KONISHI, N
    SUZUKI, T
    OKAJIMA, Y
    MIYATA, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (04) : 1169 - 1173
  • [34] Effect of thermal annealing on characteristics of polycrystalline silicon used for solar cells
    Gou, Xianfang
    Li, Xudong
    Xu, Ying
    Liang, Xinqing
    Zhao, Yuwen
    PHOTOVOLTAIC MATERIALS AND MANUFACTURING ISSUES, 2009, 1123 : 11 - +
  • [35] High efficiency polycrystalline silicon solar cells using low temperature PECVD process
    Elgamel, HEA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (10) : 2131 - 2137
  • [36] Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon
    Jung, Taeseung
    Kim, Seungyeob
    Lee, Sangho
    Ahn, Jinho
    Jeon, Sanghun
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2024, 42 (06):
  • [37] Low-temperature formation of polycrystalline silicon and its device application
    Fujiwara, H
    Nasuno, Y
    Kondo, M
    Mutsuda, A
    POLYCRYSTALLINE SEMICONDUCTORS VII, PROCEEDINGS, 2003, 93 : 99 - 108
  • [38] Low-temperature deposition of polycrystalline germanium on silicon by magnetron sputtering
    Korivi, N.
    Nujhat, N.
    Ahmed, S.
    Jiang, L.
    Das, K.
    ELECTRONICS LETTERS, 2018, 54 (17) : 1043 - +
  • [39] LOW-TEMPERATURE POLYCRYSTALLINE-SILICON TFT ON 7059 GLASS
    CZUBATYJ, W
    BEGLAU, D
    HIMMLER, R
    WICKER, G
    JABLONSKI, D
    GUHA, S
    IEEE ELECTRON DEVICE LETTERS, 1989, 10 (08) : 349 - 351
  • [40] LARGE GRAIN POLYCRYSTALLINE SILICON BY LOW-TEMPERATURE ANNEALING OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS
    HATALIS, MK
    GREVE, DW
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2260 - 2266