Interface formation of Ge/ZnSe(100) and Ge/ZnS(111) heterojunctions studied by synchrotron radiation photoemission

被引:0
|
作者
Ban, DY [1 ]
Yang, FY [1 ]
Fang, RC [1 ]
Xu, SH [1 ]
Xu, PS [1 ]
机构
[1] UNIV SCI & TECHNOL CHINA,DEPT PHYS,HEFEI 230026,PEOPLES R CHINA
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The microscopic evolution of interface formation between Ge and II-VI compounds such as ZnSe and ZnS single crystals has been studied by synchrotron radiation photoemission spectroscopy and low energy electron diffraction. Core level intensity measurements from the substrate as well as from the overlayer show a nearly ideal two-dimensional growth mode for the deposition of Ge on ZnSe(100) surface. However, there is a certain deviation from the ideal two-dimensional mode in the case of Ge/ZnS(111) due to the diffusion of substrate atoms into Ge overlayer. Surface sensitive core level spectra indicate that the reaction of Ge with S atoms at Ge/ZnS(111) interfaces is much stronger than that of Ge with Se atoms at Ge/ZnSe(100) interfaces.
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页码:590 / 600
页数:11
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