Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

被引：12
|
作者：
McClelland, GM
Rettner, CT
Hart, MW
Carter, KR
Sanchez, MI
Best, ME
Terris, BD
机构：
[1] IBM Corp, Almaden Res Ctr, Div Res, San Jose, CA 95120 USA
[2] Hitachi Global Storage Technol, San Jose Res Ctr, San Jose, CA 95120 USA
[3] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
来源：
TRIBOLOGY LETTERS | 2005年 / 19卷 / 01期
关键词：
imprint; nanoimprint; lithography; contact mechanics;
D O I：
10.1007/s11249-005-4265-6
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage.
引用
收藏
页码：59 / 63
页数：5
相关论文
共 50 条
  • [41] Diamond nanoimprint lithography
    Taniguchi, J
    Tokano, Y
    Miyamoto, I
    Komuro, M
    Hiroshima, H
    NANOTECHNOLOGY, 2002, 13 (05) : 592 - 596
  • [42] Ultrafast nanoimprint lithography
    Xia, QF
    Chou, SY
    Ultrafast Phenomena in Semiconductors and Nanostructure Materials IX, 2005, 5725 : 180 - 187
  • [43] Testing nanoimprint lithography
    不详
    MATERIALS WORLD, 2008, 16 (06) : 18 - 18
  • [44] UV-nanoimprint lithography as a tool to develop flexible microfluidics for electrochemical detection
    Chen, Juhong
    Zhou, Yiliang
    Wang, Danhui
    Rotello, Vincent
    Carter, Kenneth
    Watkins, James
    Nugen, Sam
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2015, 250
  • [45] Roller nanoimprint lithography for flexible electronic devices of a sub-micron scale
    Lim, HyungJun
    Choi, Kee-Bong
    Kim, GeeHong
    Park, SooYeon
    Ryu, JiHyeong
    Lee, JaeJong
    MICROELECTRONIC ENGINEERING, 2011, 88 (08) : 2017 - 2020
  • [46] Flexible thin-film transistors using multistep UV nanoimprint lithography
    Moonen, Pieter F.
    Vratzov, Boris
    Smaal, Wiljan T. T.
    Kjellander, B. K. Charlotte
    Gelinck, Gerwin H.
    Meinders, Erwin R.
    Huskens, Jurriaan
    ORGANIC ELECTRONICS, 2012, 13 (12) : 3004 - 3013
  • [47] Nanotextured Polymer Substrate for Flexible and Mechanically Robust Metal Electrodes by Nanoimprint Lithography
    Eom, Hyeonjin
    Kim, Jae-Han
    Hur, Junyoung
    Kim, Taek-Soo
    Sung, Sang-Keun
    Choi, Jun-Hyuk
    Lee, Eungsug
    Jeong, Jun-Ho
    Park, Inkyu
    ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (45) : 25171 - 25179
  • [48] High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography
    Buyukkose, Serkan
    Vratzov, Boris
    van der Wiel, Wilfred G.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (02):
  • [49] Nanoimprint Lithography as a Route to Nanoscale Back-Contact Perovskite Solar Cells
    Harwell, Jonathon
    Samuel, Ifor D. W.
    ACS APPLIED NANO MATERIALS, 2023, 6 (16) : 14940 - 14947
  • [50] Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching
    Zhang, Jie
    Zhang, Lin
    Han, Lianhuan
    Tian, Zhao-Wu
    Tian, Zhong-Qun
    Zhan, Dongping
    NANOSCALE, 2017, 9 (22) : 7476 - 7482
12345