Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

被引：12
|
作者：
McClelland, GM
Rettner, CT
Hart, MW
Carter, KR
Sanchez, MI
Best, ME
Terris, BD
机构：
[1] IBM Corp, Almaden Res Ctr, Div Res, San Jose, CA 95120 USA
[2] Hitachi Global Storage Technol, San Jose Res Ctr, San Jose, CA 95120 USA
[3] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
来源：
TRIBOLOGY LETTERS | 2005年 / 19卷 / 01期
关键词：
imprint; nanoimprint; lithography; contact mechanics;
D O I：
10.1007/s11249-005-4265-6
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage.
引用
收藏
页码：59 / 63
页数：5
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