A NOVEL METHODOLOGY TO MONITOR WAFER PLACEMENT SHIFT IN LASER SPIKE ANNEAL

被引：0

作者：

Gui, Yan ^{[1
]}

Jiang, Lan ^{[1
]}

Shen, Yaoting ^{[1
]}

Dong, Qingwei ^{[1
]}

Chen, Kecheng ^{[1
]}

Cheng, Xinhua ^{[1
]}

Fang, Jingxun ^{[1
]}

机构：

[1] Shanghai Huali Integrated Circuit Corp, Shanghai 201314, Peoples R China

来源：

2020 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2020 (CSTIC 2020) | 2020年

关键词：

laser anneal; placement shift; fluctuation range control;

D O I：

暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

For advanced technology node, laser anneal is widely used for ultra-shallow and low resistivity junctions which are needed to suppress short-channel effects and improve device performance. However, if wafer is not put in proper position, laser anneal will lead to PP source drain photo overlay residual abnormal, and even cause wafer broken. In this paper, a novel methodology is evaluated to earlier alert wafer placement shift in laser anneal which including measuring first laser scan region Rs fluctuation range control to detect the abnormal temperature spot combining with monitor camera installation, by this method wafer broken ratio is significantly reduced and productivity is improved eventually.

引用

页数：3

共 50 条

[1] The use of cross-section haze measurements to monitor Laser Spike Anneal (LSA) stage alignment
Wendt, Kay
Newby, John
2021 32ND ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC), 2021,
[2] Laser spike anneal for photoresists outperforms hotplate bake
不详
SOLID STATE TECHNOLOGY, 2012, 55 (09) : 10 - 10
[3] Ultra-thin SOICMOS using Laser Spike Anneal
Ren, Zhibin
Sleight, J.
Hergenrother, J. M.
Singh, D. V.
Gluschenkov, O.
Dokumaci, O.
Black, L.
Pan, J.
Lee, K. -L.
Ott, J.
Ronsheim, P.
Lee, J.
Haensch, W.
Leong, M.
Sung, C. Y.
2006 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS, AND APPLICATIONS (VLSI-TSA), PROCEEDINGS OF TECHNICAL PAPERS, 2006, : 84 - +
[4] Wafer Edge Unsalicided Poly Resistor Matching Optimization with Spike Anneal Temperature Control
Wu, Xiao Bin
Ng, Belinda
Tok, Mui Khin
Lau, Ker Peng
2024 35TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, ASMC, 2024,
[5] LASER FOCAL SHIFT MONITOR
STAMPER, JA
APPLIED OPTICS, 1976, 15 (09): : 2020 - 2022
[6] LASER FOCAL SHIFT MONITOR
STAMPER, JA
REPORT OF NRL PROGRESS, 1976, (MAY): : 38 - 39
[7] LASER FOCAL SHIFT MONITOR
STAMPER, JA
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (04): : 597 - 597
[8] Emission Feedback Control System for Sub-millisecond Laser Spike Anneal
McWhirter, James T.
Gaines, David
Zambon, Paolo
16TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS - RTP 2008, 2008, : 157 - 162
[9] Wafer temperature measurement and control during laser spike annealing
Chen, Shaoyin
Hebb, Jeff
Jain, Amitabh
Shetty, Shrinivas
Wang, Yun
15TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS - RTP 2007, 2007, : 239 - +
[10] Novel strategy for wafer induced shift (WIS)
Sentoku, K
Matsumoto, T
Ina, H
OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 981 - 989

← 1 2 3 4 5 →