Source Optimization in Optical Lithography

被引：1
|
作者：
Barouch, E. [1 ]
Orszag, S. A. [2 ]
机构：
[1] Boston Univ, Dept Mech Engn, Boston, MA 02215 USA
[2] Yale Univ, New Haven, CT 06520 USA
来源：
STUDIES IN APPLIED MATHEMATICS | 2012年 / 128卷 / 02期
关键词：
SIMULATION;
D O I：
10.1111/j.1467-9590.2011.00532.x
中图分类号：
O29 [应用数学];
学科分类号：
070104 ;
摘要：
A method to reshape the structure of the optical source in optical lithography is presented. The goal of this reshaping is to provide a new ability to perform resolution enhancements to a cutting edge optical lithographic system. The redesign of the sources shape is performed through an optimization scheme, which has been developed specifically for this problem. The method is presented here and several examples are given to its potential power and efficacy.
引用
收藏
页码：144 / 158
页数：15
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