Source optimization using particle swarm optimization algorithm in optical lithography

被引：0
|
作者：
Wang, Lei [1 ,2 ]
Li, Sikun [1 ]
Wang, Xiangzhao [1 ,2 ]
Yan, Guanyong [1 ,2 ]
Yang, Chaoxing [1 ,2 ]
机构：
[1] Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai,201800, China
[2] University of Chinese Academy of Sciences, Beijing,100049, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 2015年 / 35卷 / 04期
关键词：
Compendex;
D O I：
10.3788/AOS201535.0422002
中图分类号：
学科分类号：
摘要：
Photolithography
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