Surface and gas phase chemistry of atomic layer deposition processes studied using tandem gas chromatography-mass spectrometry

被引：0
|
作者：
Bouman, Menno [1 ]
Zaera, Francisco [1 ]
机构：
[1] Univ Calif Riverside, Riverside, CA 92521 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2011年 / 241卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
218-COLL
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页数：1
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