Numerical Study of the Impact of Process Variations on the Motional Resistance of Weakly Coupled MEMS Resonators

被引:0
|
作者
Erbes, Andreja [1 ]
Thiruvenkatanathan, Pradyumna [1 ]
Seshia, Ashwin A. [1 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
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中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper presents a numerical study of the impact of process-induced variations on the achievable motional resistance R-x of one-dimensional, cyclic and cross-coupled architectures of electrostatically transduced MEMS resonators operating in the 250 kHz range. Monte Carlo numerical simulations which accounted for up to 0.75% variation in critical resonator feature sizes were initiated on 1, 2, 3, 4, 5 and 9 coupled MEMS resonators for three distinct coupling architectures. Improvements of 100X in the spread of R-x and 2.7X in mean achievable R-x are reported for the case of 9 resonators when implemented in the cross-coupled topology, as opposed to the traditional one-dimensional chain.
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页码:674 / 677
页数:4
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