Low noise InAlAs/InGaAs HEMTs grown by MOVPE

被引:2
|
作者
Docter, DP [1 ]
Elliott, KR [1 ]
Schmitz, AE [1 ]
Kiziloglu, K [1 ]
Brown, JJ [1 ]
Harvey, DS [1 ]
Karatnicki, HM [1 ]
机构
[1] Hughes Res Labs, Malibu, CA 90265 USA
关键词
D O I
10.1109/ICIPRM.1998.712441
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have demonstrated the MOVPE growth of high quality InAlAs/InGaAs on InP HEMT devices that are suitable for low noise amplifier applications. We have developed a growth process to reduce unwanted residual background charge typically found in MOVPE grown InAlAs/InGaAs HEMT structures to less than 9E9cm(-2). We have demonstrated the growth of HEMT devices over a wide range of sheet charge (similar to 4E10-4E12cm(-2)) while maintaining Hall mobilities greater than 10,500cm(2)/Vs. HEMT devices with gate length of 0.15 mu m were fabricated and tested. Excellent device performance is observed. Noise performance was measured from 26GHz and S-parameter data was taken from 0.5-40GHz. The unity current cutoff frequency of 108GHz and minimum noise figure of 1.3dB with associated gain of more than 10dB at 26GHz demonstrate that the MOVPE growth technique can be applied to the low cost production of InAlAs/InGaAs HEMT for RF and low noise amplifier applications.
引用
收藏
页码:219 / 222
页数:4
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