Spectrophotometric Characterization of Thin Semi-Transparent Aluminum Films Prepared by Electron Beam Evaporation and Magnetron Sputtering

被引：2

作者：

Wilbrandt, Steffen ^{[1
]}

Stenzel, Olaf ^{[1
,2
]}

Liaf, Abrar ^{[1
,2
]}

Munzert, Peter ^{[1
]}

Schwinde, Stefan ^{[1
]}

Stempfhuber, Sven ^{[1
]}

Felde, Nadja ^{[1
]}

Trost, Marcus ^{[1
]}

Seifert, Tina ^{[1
]}

Schroeder, Sven ^{[1
]}

机构：

[1] Fraunhofer Inst Appl Opt & Precis Engn IOF, Albert Einstein Str 7, D-07745 Jena, Germany

[2] Friedrich Schiller Univ Jena, Abbe Sch Photon, Albert Einstein Str 6, D-07745 Jena, Germany

来源：

COATINGS | 2022年 / 12卷 / 09期

关键词：

aluminum films; film thickness; layer deposition; optical constants; reflectance; OPTICAL-PROPERTIES; EMPIRICAL EXTENSION; SEED LAYERS; COATINGS; REFLECTANCE; ULTRAVIOLET; MODEL; AU; AG; AL;

D O I：

10.3390/coatings12091278

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been performed using a merger of three standard dispersion models, namely the Drude model, the Lorentzian oscillator model, and the beta-distributed oscillator model. A thickness dependence of the optical constants could be established in the investigated thickness range.

引用

页数：17

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