Reticle defects on optical proximity correction features

被引：1
|
作者：
Zurbrick, LS [1 ]
机构：
[1] KLA Tencor Corp, San Jose, CA 95134 USA
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY V | 1998年 / 3412卷
关键词：
defect inspection; optical proximity correction;
D O I：
10.1117/12.328858
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspection algorithms and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.
引用
收藏
页码：471 / 479
页数：9
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