Reticle defects on optical proximity correction features

被引：1
|
作者：
Zurbrick, LS [1 ]
机构：
[1] KLA Tencor Corp, San Jose, CA 95134 USA
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY V | 1998年 / 3412卷
关键词：
defect inspection; optical proximity correction;
D O I：
10.1117/12.328858
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspection algorithms and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.
引用
收藏
页码：471 / 479
页数：9
相关论文
共 50 条
  • [21] Yield management and reticle defects
    Ibsen, K
    Eickhoff, M
    Ma, ZM
    Shaw, SY
    Carlson, S
    Tomomatsu, H
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 266 - 275
  • [22] The printability of backside reticle defects
    Volk, W
    Wiley, JN
    Reynolds, JA
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 579 - 585
  • [23] Reticle processing induced proximity effects.
    Janssen, M
    de Kruif, R
    Kiers, T
    18TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2002, 4764 : 82 - 94
  • [24] Pattern measurements of reticles with optical proximity correction assist features using the atomic force microscope
    Chao, KJ
    Plano, RJ
    Kingsley, JR
    Chen, F
    Caldwell, R
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIII, PTS 1 AND 2, 1999, 3677 : 991 - 1000
  • [25] Metrology issues of reticles with optical proximity correction assist features using the atomic force microscope
    Chao, KJ
    Plano, RJ
    Kingsley, JR
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 756 - 763
  • [26] Contour-based Optical Proximity Correction
    Zhou, Brian
    Zhu, Liang
    Zhang, Yingchun
    Gu, Yili
    Kang, Xiaohui
    DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION III, 2009, 7275
  • [27] Application of a new approach to optical proximity correction
    Rosenbusch, A
    Hourd, A
    Juffermans, C
    Kirsch, H
    Lalanne, F
    Maurer, W
    Romeo, C
    Ronse, K
    Schiavone, P
    Simecek, M
    Toublan, O
    Vermeulen, T
    Watson, J
    Ziegler, W
    Zimmermann, R
    OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 639 - 647
  • [28] Benchmarking of software tools for optical proximity correction
    Jungmann, A
    Thiele, J
    Friedrich, C
    Pforr, R
    Maurer, W
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 921 - 931
  • [29] Optical Proximity Correction with Hierarchical Bayes Model
    Matsunawa, Tetsuaki
    Yu, Bei
    Pan, David Z.
    OPTICAL MICROLITHOGRAPHY XXVIII, 2015, 9426
  • [30] Hybrid Optical Proximity Correction - concepts and results
    Hung, M
    Balasingam, P
    22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1173 - 1180
12345