Spectroscopic ellipsometric study of the optical properties of Ag2O film prepared by direct-current magnetron reactive sputtering

被引:0
|
作者
Gao Xiao-Yong [1 ]
Feng Hong-Liang [1 ]
Ma Jiao-Min [1 ]
Zhang Zeng-Yuan [1 ]
机构
[1] Zhengzhou Univ, Key Lab Mat Phys, Minist Educ, Sch Phys & Engn, Zhengzhou 450052, Peoples R China
基金
中国国家自然科学基金;
关键词
Ag2O film; spectroscopic ellipsometry; general oscillator model; single-oscillator model; SILVER-OXIDE FILMS; THIN-FILMS; LUMINESCENCE; TECHNOLOGY; CONSTANT; BEHAVIOR;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The Ag2O film, as-deposited by direct-current magnetron reactive sputtering at a substrate temperature of 150 degrees C, clearly shows a preferential orientation (111), and is capable of lowering the threshold value of the thermal decomposition temperature to about 200 degrees C, which is helpful to its application in optical and magneto-optical storage. This paper fits its optical constants in terms of a general oscillator model by using measured ellipsometric parameters. The fitted oscillator energy 2.487 eV is close to the optical direct interband transition energy value of the Ag2O film determined by Tauc equation; whereas, the fitted oscillator energy 4.249 eV is far from the fitted plasma oscillator energy 4.756 eV by single-oscillator energy. The photoluminescence spectrum centred at about 2.31 eV indicates a direct-energy gap photoluminescence mechanism of the Ag2O film.
引用
收藏
页数:6
相关论文
共 50 条
  • [41] Electrical characteristics of thin Ta2O5 films deposited by reactive pulsed direct-current magnetron sputtering
    Kim, JY
    Nielsen, MC
    Rymaszewski, EJ
    Lu, TM
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (03) : 1448 - 1452
  • [42] Electrical characteristics of thin Ta2O5 films deposited by reactive pulsed direct-current magnetron sputtering
    Kim, J.-Y.
    Nielsen, M.C.
    Rymaszewski, E.J.
    Lu, T.-M.
    1600, American Institute of Physics Inc. (87):
  • [43] Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy
    Stolz, A.
    Soltani, A.
    Abdallah, B.
    Charrier, J.
    Deresmes, D.
    Jouan, P.-Y.
    Djouadi, M.A.
    Dogheche, E.
    De Jaeger, J.-C.
    Thin Solid Films, 2013, 535 (01) : 442 - 445
  • [44] Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy
    Stolz, A.
    Soltani, A.
    Abdallah, B.
    Charrier, J.
    Deresmes, D.
    Jouan, P. -Y.
    Djouadi, M. A.
    Dogheche, E.
    De Jaeger, J. -C.
    THIN SOLID FILMS, 2013, 534 : 442 - 445
  • [45] A study of the optical properties of titanium oxide films prepared by dc reactive magnetron sputtering
    Meng, Li-Jian
    Teixeira, V.
    Cui, H. N.
    Placido, Frank
    Xu, Z.
    dos Santos, M. P.
    APPLIED SURFACE SCIENCE, 2006, 252 (22) : 7970 - 7974
  • [46] Optical properties of CdIn2O4 thin films prepared by DC reactive magnetron sputtering
    Yang, F. F.
    Fang, L.
    Zhang, S. F.
    Liao, K. J.
    Liu, G. B.
    Dong, J. X.
    Li, L.
    Fu, G. Z.
    JOURNAL OF CRYSTAL GROWTH, 2006, 297 (02) : 411 - 418
  • [47] Microstructure and Properties of CrAlSiN Coatings Deposited by HiPIMS and Direct-Current Magnetron Sputtering
    Fan, Qixiang
    Liang, Yangmengtian
    Wu, Zhenghuan
    Liu, Yanmei
    Wang, Tiegang
    COATINGS, 2019, 9 (08)
  • [48] Microstructures and properties of Ag-DLC films prepared by magnetron reactive sputtering
    Department of Mechanical and Electrical Engineering, Fujian Polytechnic of Information Technology, Fuzhou 350003, China
    不详
    不详
    Fenmo Yejin Cailiao Kexue yu Gongcheng, 1 (108-115):
  • [49] Optical properties of Al2O3 thin film prepared through medium-frequency reactive magnetron sputtering process
    School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, China
    不详
    不详
    Dongbei Daxue Xuebao, 2007, 5 (687-691):
  • [50] OPTICAL AND STRUCTURAL PROPERTIES OF Cu2O THIN FILM AS ACTIVE LAYER IN SOLAR CELLS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING
    Sawicka-Chudy, P.
    Wisz, G.
    Sibinski, M.
    Cholewa, M.
    Potera, P.
    Glowa, L.
    Pawelek, R.
    ARCHIVES OF METALLURGY AND MATERIALS, 2019, 64 (01) : 243 - 250