InGaP/GaAs-based multijunction solar cells

被引:150
|
作者
Takamoto, T
Kaneiwa, M
Imaizumi, M
Yamaguchi, M
机构
[1] Sharp Co Ltd, Yamato Koriyama, Nara 6391186, Japan
[2] Japan Aerosp Explorat Agcy, Tsukuba, Ibaraki 3058505, Japan
[3] Toyota Technol Inst, Nagoya, Aichi 4688511, Japan
来源
PROGRESS IN PHOTOVOLTAICS | 2005年 / 13卷 / 06期
关键词
multijunction; solar cell; GaAs; concentrator; thin-film; radiation resistance;
D O I
10.1002/pip.642
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The conversion efficiency of InGaP/(In)GaAs/Ge -based multijunction solar cells has been improved up to 29-30% (AM0) and 31-32% (AM1(.)5G) by technologies, such as double-hetero wide band-gap tunnel junctions, combination with Ge bottom cell with the InGaP first hetero-growth layer, and precise lattice-matching to Ge substrate by adding 1% indium to the conventional GaAs lattice-match structure. Employing a 1.95 eV AlInGaP top cell should improve efficiency further. For space use, radiation resistance has been improved by technologies such as introducing of an electric field in the base layer of the lowest-resistance middle cell, and EOL current matching of sub-cells to the highest-resistance top cell. A grid structure and cell size have been designed for concentrator applications in order to reduce the energy loss due to series resistance, and 38% (AM1(.)5G, 100-500 suns) efficiency has been demonstrated. Furthermore, thin-film structure which is InGaP/GaAs dual junction cell on metal film has been newly developed. The thin-film cell demonstrated high flexibility, lightweight, high efficiency of over 25% (AM0) and high radiation resistance. Copyright (c) 2005 John Wiley & Sons, Ltd.
引用
收藏
页码:495 / 511
页数:17
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