Epitaxial growth of Heusler alloy Co2MnSi/MgO heterostructures on Ge(001) substrates

被引:15
|
作者
Li, Gui-fang [1 ]
Taira, Tomoyuki [1 ]
Matsuda, Ken-ichi [1 ]
Arita, Masashi [1 ]
Uemura, Tetsuya [1 ]
Yamamoto, Masafumi [1 ]
机构
[1] Hokkaido Univ, Div Elect Informat, Sapporo, Hokkaido 0600814, Japan
基金
日本科学技术振兴机构;
关键词
FILMS;
D O I
10.1063/1.3605675
中图分类号
O59 [应用物理学];
学科分类号
摘要
We prepared Heusler alloy Co2MnSi/MgO heterostructures on single-crystal Ge(001) substrates through magnetron sputtering for Co2MnSi and electron beam evaporation for MgO as a promising candidate for future generation spin-based functional devices. Structural investigations showed that the Co2MnSi/MgO heterostructure was grown epitaxially on a Ge(001) substrate with extremely smooth and abrupt interfaces and showed the L2(1) structure for the Co2MnSi film. Furthermore, a sufficiently high saturation magnetization (mu(s)) value of 5.1 mu(B)/f.u. at 10 K, which is close to the theoretically predicted mu(s) of 5.0 mu(B)/f.u. for half-metallic Co2MnSi, was obtained for prepared Co2MnSi films. (C) 2011 American Institute of Physics. [doi:10.1063/1.3605675]
引用
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页数:3
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