Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique

RF sputtering process has been used to deposit highly transparent and conducting films of tin-doped indium oxide onto quartz substrates keeping the RF power constant at 250 W. The electrical, optical and structural properties have been investigated as a function of substrate temperature. XRD has shown that deposited films are polycrystalline and have (400) preferred orientation. Indium tin oxide layers with low resistivity values and high transmittance in the visible region have been deposited. Detailed Analyses based on X-ray diffraction, optical and electrical results are attempted to gain more insight into the factors that are governed by the influence of varying substrate temperature in this investigation. AFM pictures showed uniform surface morphology with very low surface roughness values. It has been observed that ITO films deposited in this study, keeping the substrate temperature at 150 degrees C, can provide the required optimum electrical and optical properties rendering them useful for developing many optoelectronic devices at a moderate temperature.