A Single-Ended Low Power 16-nm FinFET 6T SRAM Design With PDP Reduction Circuit

被引:5
|
作者
Wang, Chua-Chin [1 ,2 ]
Sangalang, Ralph Gerard B. [1 ]
Tseng, I-Ting [1 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Elect Engn, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Inst Undersea Technol, Kaohsiung 80424, Taiwan
关键词
SRAM cells; FinFETs; Transistors; Circuit faults; Voltage measurement; Threshold voltage; Semiconductor device measurement; Static RAM; built-in self test; voltage supply selector; PDP reduction circuit; read voltage boosting; COMPENSATION;
D O I
10.1109/TCSII.2021.3123676
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Memory arrays such as SRAM cells are responsible to the high-power consumption of modern digital systems. This investigation proposed an SRAM utilizing an ultra-low power cell, implemented using the 16-nm FinFET CMOS technology. Voltage supply selection of the static RAM cells is done by gating the wordline (WL) enable. In standby mode, the cell wordline is not activated, where the cell operates on a lower voltage level so that the stored bit status is still retained. On the other hand, the normal mode is activated when the wordline of the cell is enabled. Theoretical derivations, all-PVT-corner post-layout simulations, and measurement results were provided for verification of the functionality and performance. An SRAM of 1-kb capacity is designed based on the propose cell. The on-silicon measurement demonstrates 0.006832 fJ (energy/bit) at 500 MHz clock rate and 0.8 V supply.
引用
收藏
页码:3478 / 3482
页数:5
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